This system is used for the fully automated loading and unloading of silicon wafers from graphite process boats for processing in a batch PECVD system. The accurate position of the wafers in the graphite boats is essential to ensure the flawless electric contact with the wafer that serves as the basis for a stable PECVD process. For nearly a decade, Jonas & Redmann WHP has defined the state-of-the-art in production cluster anti reflective coating with PECVD direct plasma. The new generation of Jonas & Redmann Wafer Handling Plasma - WHP is the result of this continuous development: it can be modularly configured and therefore perfectly adjusted to suit the performance of the process cluster. It is this innovation which helps customers to achieve a dramatic increase in system productivity.
Wafer Handling PlasmaSix-axis robot with multiple grippers designed to protect wafers - The wafers are automatically isolated from the carriers in the machine and inserted into the boat using a 6-axis robot.
Process control - The system can be fitted with a measuring device for visual color inspection and sheet thickness measurement.