Roth & Rau’s MAiA

  • MAiA

MAiA is a further development of the SiNA series to implement new cell technologies and to introduce new production steps. The applications include back side passivation, the creation of gradient and multilayer coatings (for example, SiNx + SiOy) as well as plasma etching technologies for texture or PSG removal.

The modular structure of the plants also allows the combination of different processes to form one plant (for example, the combination of standard anti-reflex coating of wafer front side and coating of wafer back side for its passivation). With respect to the throughput and the wafer handling, the MAiA plants can be compared with the SiNA plants.




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