High solar cell efficiency requires good and consistent wafer texture quality. Random offline measurement, such as weighing before and after etching, is labor intensive and only reveals process drifts with a large time-delay.
OSIS Texture immediately shows the reflection drift, when for example, the concentration or temperature of the acid bath changes. This allows you to directly take counter measures, which results in consistent texture quality and low reflection for all wafers that you produce. On top of that labor for tedious offline measurements is eliminated.