CVD Reactor

centrotherm has developed and constructed a CVD reactor for industrial silicon production. In the chemical vapor deposition process, silicon is deposited from the gas phase. Hydrogen (H2) and ultra-clean trichlorosilane (TCS) are used as precursors which react to deposit silicon under high temperatures and high pressure.

  •     Improved design/engineering
  •     Proven process/technology
  •     Low energy consumption: < 90 kWh/kg
  •     High capacity: up to 170 metric tons/year
     

Partners

Acknowledgements

Solar Media