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The centrotherm vent gas recovery system (VGR) is used for the treatment of both reactor and converter vent gas streams. The VGR consists of a main process area with distillation columns and condensation units, supplied by a compressor unit and a refrigeration unit. The basic design already includes enhanced condensation capacity and separate condensate tank for converter quench gas stream.
The centrotherm multi-crystalline ingot furnace is designed for the production of multi-crystalline ingots from polysilicon pieces by directional solidification based on the vertical gradient-freeze method. The multi-crystalline ingot furnace consists of a stainless steel vacuum vessel with integrated water cooling. It contains an electro-mechanical opening and closing mechanism and comes with an integrated crucible loading tool. For process control it is fully automated and includes two independent adjustable heating zones.
The miniature version of the CVD reactor is an ideal analysis tool for silicon quality control. The reactor is also an excellent training tool for the CVD process. It is a very popular product as it is easy to use and highly automated.
In addition to CVD-reactors centrotherm also supplies STC-TCS converters. They transform the silicon tetrachloride produced in the CVD process into trichlorosilane, which in turn is recycled into the process. Silicon production costs are significantly reduced thanks to the recovery of trichlorosilane.
centrotherm has developed and constructed a CVD reactor for industrial silicon production. In the chemical vapor deposition process, silicon is deposited from the gas phase. Hydrogen (H2) and ultra-clean trichlorosilane (TCS) are used as precursors which react to deposit silicon under high temperatures and high pressure.
c.BONITE is suitable for PECVD deposition processes in research & development. Ease of maintenance is ensured since the deposition is physically confined to the graphite boats holding the wafers. The process chamber is only marginally affected by parasitic deposition. Thus, chamber cleaning is reduced to yearly or bi-yearly tasks without notable impact on tool uptime.
c.LAS combines excellent process performance with a small footprint and low total cost of ownership. The linear transport system allows simple wafer handling with a very low rate of wafer breakage. centrotherm provides c.LAS together with additional equipment and best in market process knowledge for selective emitter formation.
For drying the metal contacts on the wafers centrotherm photovoltaics supplies drying furnaces that are designed for high volume solar cell production. Our conveyor drying furnaces feature high throughput, whereas the modular design ensures an optimized drying process. Optionally the furnaces are available with air condensation for exhaust gas cleaning.
centrotherm photovoltaics supplies fast firing furnaces for sintering the metal contacts to ensure good electrical contact with the silicon. These conveyor furnaces feature highest throughput as well as low cost of ownership. Due to high belt speed and a long burn out zone the furnaces achieve a short cycle time and remove all organics. Besides, our fast firing furnaces are available with integrated high speed dryers that eliminate one handling step.
For anti-reflective coating, a key process in solar cell production, centrotherm photovoltaics offers PECVD systems for the deposition of silicon nitride. Due to high availability, low downtime and low cost of ownership our PECVD systems suit perfectly for serial production. Besides, our product range contains low pressure systems with high process flexibility for anti-reflective coating in research and development.